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Synfacts 2010(5): 0543-0543  
DOI: 10.1055/s-0029-1219685
Synthesis of Materials and Unnatural Products
© Georg Thieme Verlag Stuttgart ˙ New York

Active Material and Photoresist in One Novel Polymer

Contributor(s): Timothy M. Swager, Stefanie A. Sydlik
J. Bouffard, M. Watanabe, H. Takaba, K. Itami*
Nagoya University and Osaka Municipal Technical Research Institute, Japan
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Publication History

Publication Date:
22 April 2010 (online)

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Significance

The conversion of P1 to P2 using a photoacid generator (PAG) in the solid state allows for streamlined photopatterning by combining the photoresist and active material into one. This is an important step towards increasing the efficiency of the surface patterning of luminescent conjugated polymers.