Synthesis 2007(14): 2203-2207  
DOI: 10.1055/s-2007-983758
PAPER
© Georg Thieme Verlag Stuttgart · New York

Simultaneous Deprotection and Purification Based on Ionic Resin Capture: Application to Amide Formations and Grignard and Mitsunobu Reactions

Peter Meier*, Sascha Müller
Global Discovery Chemistry, Novartis Institutes for BioMedical Research Basel, Lichtstraße 35, 4056 Basel, Switzerland
Fax: +41(61)3244236; e-Mail: peter.meier@novartis.com;
Further Information

Publication History

Received 16 April 2007
Publication Date:
03 July 2007 (online)

Abstract

Products containing Boc- or Tr-protected amines were caught directly out of reaction mixtures by simultaneous cleavage of the protecting group. By releasing the products with ammonia the corresponding free amines were obtained in high yields and purities. The broadly applicable method of simultaneous deprotection and purification based on ionic resin capture was applied for Grignard and Mitsunobu reactions as well as amide formations and show a high potential for multiparallel synthesis.

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Bondesil SCX (purchased from Varian Deutschland GmbH, Darmstadt, Germany) was used since this silica-based scavenger has a high density that facilitates the settling after shaking in multiparallel fashion. The solvent can be removed therefore faster and more easily than with an organic-polymer-based ion-exchange resin.

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Grignard reagents were purchased from Rieke Metals Inc. (NE, USA; 2a) or Fluka Chemie GmbH (CH; 2b, 2c, 2c, 2d) as solutions in THF. Compound 1 and the alcohols 5b and 5d were supplied by ABCR GmbH & Co KG (Karlsruhe, Germany). All other reagents, Dowex 2X8-200 and solvents were purchased from Fluka Chemie GmbH (Buchs-CH).